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Wet and Siconi® cleaning sequences for SiGe p-type metal...

Microelectronic Engineering 2018 / 02 Vol. 187-188

Wet and Siconi® cleaning sequences for SiGe p-type metal oxide semiconductor channels

Raynal, P.E., Loup, V., Vallier, L., Martin, M., Moeyaert, J., Pelissier, B., Rodriguez, Ph., Hartmann, J.M., Besson, P.
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Volume:
187-188
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.12.003
Date:
February, 2018
File:
PDF, 334 KB
english, 2018
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