Nearly Anhydrous Undissociated HF for the Removal of Hf /...

ECS Transactions 2017 / 08 Vol. 80; Iss. 2

Nearly Anhydrous Undissociated HF for the Removal of Hf / Ta / Zr Based Polymers after Plasma Etch, Selectively to Aluminum

Cazes, Marine, Broussous, Lucile, Garnier, Philippe, Pizzetti, Christian, Gabette, Laurence, Besson, Pascal
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Volume:
80
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/08002.0199ecst
Date:
August, 2017
File:
PDF, 8.25 MB
english, 2017
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