![](/img/cover-not-exists.png)
Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry
Ishii, Yohei, Okuma, Kazumasa, Saldana, Tiffany, Maeda, Kenji, Negishi, Nobuyuki, Manos, JimVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HB07
Date:
June, 2017
File:
PDF, 1.11 MB
english, 2017