Influence of N 2 /H...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2018 / 01 Vol. 36; Iss. 1

Influence of N 2 /H 2 and N 2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition

Alevli, Mustafa, Gungor, Nese
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4998920
Date:
January, 2018
File:
PDF, 2.29 MB
english, 2018
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