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In situ annealing and high-rate silicon epitaxy on porous silicon by mesoplasma process
Zhang, Sheng, Lu, Ziyu, Sheng, Jiang, Gao, Pingqi, Yang, Xi, Wu, Sudong, Ye, Jichun, Kambara, MakotoVolume:
9
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.9.055506
Date:
May, 2016
File:
PDF, 864 KB
english, 2016