Optical proximity correction (OPC) in near-field...

Nanotechnology 2018 / 01 Vol. 29; Iss. 4

Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulation

Oh, Seonghyeon, Han, Dandan, Shim, Hyeon Bo, Hahn, Jae W
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Volume:
29
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/aa9f62
Date:
January, 2018
File:
PDF, 2.53 MB
english, 2018
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