Radiation hard pixel sensors using high-resistive wafers in...

Journal of Instrumentation 2017 / 06 Vol. 12; Iss. 6

Radiation hard pixel sensors using high-resistive wafers in a 150 nm CMOS processing line

Pohl, D.-L., Hemperek, T., Caicedo, I., Gonella, L., Hügging, F., Janssen, J., Krüger, H., Macchiolo, A., Owtscharenko, N., Vigani, L., Wermes, N.
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Volume:
12
Language:
english
Journal:
Journal of Instrumentation
DOI:
10.1088/1748-0221/12/06/P06020
Date:
June, 2017
File:
PDF, 1.84 MB
english, 2017
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