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A Nitrided Interfacial Oxide for Interface State Improvement in Hafnium Zirconium Oxide-Based Ferroelectric Transistor Technology
Tan, Ava J., Yadav, Ajay K., Chatterjee, Korok, Kwon, Daewoong, Kim, Sangwan, Hu, Chenming, Salahuddin, SayeefVolume:
39
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2017.2772791
Date:
January, 2018
File:
PDF, 757 KB
english, 2018