Impact of process parameters on the structural and electrical properties of metal/PZT/Al2O3/silicon gate stack for non-volatile memory applications
Singh, Prashant, Jha, Rajesh Kumar, Singh, Rajat Kumar, Singh, B. R.Volume:
124
Language:
english
Journal:
Applied Physics A
DOI:
10.1007/s00339-018-1555-z
Date:
February, 2018
File:
PDF, 2.09 MB
english, 2018