A method to determine the pressure and densities of gas stored in blisters: Application to H and He sequential ion implantation in silicon
Daghbouj, N., Cherkashin, N., Claverie, A.Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2018.01.006
Date:
January, 2018
File:
PDF, 894 KB
english, 2018