Influence of Si precursor type on the surface roughening of SiGe epitaxial layers deposited by ultrahigh vacuum chemical vapor deposition method
Kim, Youngmo, Yoon, Sungyeol, Ko, Daehong, Sohn, HyunchulVolume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4986490
Date:
July, 2017
File:
PDF, 1.55 MB
english, 2017