Atomic layer deposition of molybdenum disulfide films using...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2018 / 01 Vol. 36; Iss. 1

Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S

Mane, Anil U., Letourneau, Steven, Mandia, David J., Liu, Jian, Libera, Joseph A., Lei, Yu, Peng, Qing, Graugnard, Elton, Elam, Jeffrey W.
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.5003423
Date:
January, 2018
File:
PDF, 2.38 MB
english, 2018
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