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Heating power at the substrate, electron temperature, and electron density in 2.45 GHz low-pressure microwave plasma
Kais, A., Lo, J., Thérèse, L., Guillot, Ph.Volume:
25
Language:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.5005592
Date:
January, 2018
File:
PDF, 1.79 MB
english, 2018