Study on the RF inductively coupled plasma spheroidization of refractory W and W-Ta alloy powders
YU, Chenfan, ZHOU, Xin, WANG, Dianzheng, VAN LINH, Neuyen, LIU, WeiVolume:
20
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/2058-6272/aa8e94
Date:
January, 2018
File:
PDF, 3.53 MB
english, 2018