Effects of Oxygen Impurity and of Heat-Treatment on Thermal...

Journal of the Physical Society of Japan 1990 / 12 Vol. 59; Iss. 12

Effects of Oxygen Impurity and of Heat-Treatment on Thermal Diffusivity of Sputtered SiC Film

H. Ohashi, Yoshiko, Umezawa, Tomokazu, Fukuchi, Mitsuru, Ohashi, Kazutoshi, Oyama, Masanori, Kato, Makio
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Volume:
59
Journal:
Journal of the Physical Society of Japan
DOI:
10.1143/JPSJ.59.4362
Date:
December, 1990
File:
PDF, 735 KB
1990
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