Plasma emission spectroscopy and its relation to the refractive index of silicon nitride thin films deposited by reactive magnetron sputtering
Sangines, Roberto, Abundiz-Cisneros, Noemi, Hernández-Utrera, Oscar, Diliegros-Godines, Carolina, Machorro-Mejía, RobertoLanguage:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aaa8d4
Date:
January, 2018
File:
PDF, 1.34 MB
english, 2018