Low-temperature deposition of SiNx Films in SiH4/Ar + N2...

Semiconductors 2017 / 11 Vol. 51; Iss. 11

Low-temperature deposition of SiNx Films in SiH4/Ar + N2 inductively coupled plasma under high silane dilution with argon

Okhapkin, A. I., Korolyov, S. A., Yunin, P. A., Drozdov, M. N., Kraev, S. A., Khrykin, O. I., Shashkin, V. I.
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Volume:
51
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782617110215
Date:
November, 2017
File:
PDF, 336 KB
english, 2017
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