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Examination of various characteristics for sputtered tantalum oxide-nitride thin films deposited at various oxygen flowrates
Gandhi, Akash A., Chauhan, Kamlesh V., Kapopara, Jaydeep M., Jariwala, Nayan N., Rawal, Sushant K.Volume:
185
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584587.2017.1370286
Date:
November, 2017
File:
PDF, 1.12 MB
english, 2017