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Benefit of precise control of surface reaction by new patterning technique for small-contact etching with TiN hard mask
Tabata, Masahiro, Tsuji, Akihiro, Katsunuma, Takayuki, Honda, MasanobuVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HB08
Date:
June, 2017
File:
PDF, 1.31 MB
english, 2017