In-liquid Plasma. A stable light source for advanced oxidation processes in environmental remediation
Tsuchida, Akihiro, Shimamura, Takeshi, Sawada, Seiya, Sato, Susumu, Serpone, Nick, Horikoshi, SatoshiLanguage:
english
Journal:
Radiation Physics and Chemistry
DOI:
10.1016/j.radphyschem.2018.01.028
Date:
February, 2018
File:
PDF, 910 KB
english, 2018