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Thermal stability of atomic layer deposited WC x N y electrodes for metal oxide semiconductor devices
Zonensain, Oren, Fadida, Sivan, Fisher, Ilanit, Gao, Juwen, Danek, Michal, Eizenberg, MosheVolume:
123
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5008515
Date:
January, 2018
File:
PDF, 1.88 MB
english, 2018