Oxygen Nitrogen Mixture Effect on Aluminum Nitride...

Semiconductors 2018 / 2 Vol. 52; Iss. 2

Oxygen Nitrogen Mixture Effect on Aluminum Nitride Synthesis by Reactive Ion Plasma Deposition

Lubyanskiy, Ya. V., Bondarev, A. D., Soshnikov, I. P., Bert, N. A., Zolotarev, V. V., Kirilenko, D. A., Kotlyar, K. P., Pikhtin, N. A., Tarasov, I. S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
52
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782618020070
Date:
February, 2018
File:
PDF, 523 KB
english, 2018
Conversion to is in progress
Conversion to is failed