Stress induced by incorporation of sulfate ions into aluminum oxide films
Dou, Qi, van Overmeere, Quentin, Shrotriya, Pranav, Li, Wenfang, Hebert, Kurt R.Volume:
88
Language:
english
Journal:
Electrochemistry Communications
DOI:
10.1016/j.elecom.2018.01.015
Date:
March, 2018
File:
PDF, 476 KB
english, 2018