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A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution
Zastrau, U., Rödel, C., Nakatsutsumi, M., Feigl, T., Appel, K., Chen, B., Döppner, T., Fennel, T., Fiedler, T., Fletcher, L. B., Förster, E., Gamboa, E., Gericke, D. O., Göde, S., Grote-Fortmann, C.,Volume:
89
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.5007950
Date:
February, 2018
File:
PDF, 17.68 MB
english, 2018