Low-temperature formation of c...

Japanese Journal of Applied Physics 2018 / 01 Vol. 57; Iss. 1S

Low-temperature formation of c -axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering

Takenaka, Kosuke, Satake, Yoshikatsu, Uchida, Giichiro, Setsuhara, Yuichi
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Volume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.01AD06
Date:
January, 2018
File:
PDF, 2.15 MB
english, 2018
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