Optimization of Gas Composition Used in Plasma Chemical Vaporization Machining for Figuring of Reaction-Sintered Silicon Carbide with Low Surface Roughness
Sun, Rongyan, Yang, Xu, Ohkubo, Yuji, Endo, Katsuyoshi, Yamamura, KazuyaVolume:
8
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/s41598-018-20849-5
Date:
December, 2018
File:
PDF, 2.11 MB
english, 2018