[IEEE 2017 IEEE 12th International Conference on ASIC (ASICON) - Guiyang (2017.10.25-2017.10.28)] 2017 IEEE 12th International Conference on ASIC (ASICON) - NiGe metal source/drain Ge pMOSFETs for future high performance VLSI circuits applications
Zhang, Rui, Han, Jinghui, Li, Junkang, Tang, Xiaoyu, Zhao, YiYear:
2017
DOI:
10.1109/ASICON.2017.8252661
File:
PDF, 358 KB
2017