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[IEEE 2017 IEEE 12th International Conference on ASIC (ASICON) - Guiyang (2017.10.25-2017.10.28)] 2017 IEEE 12th International Conference on ASIC (ASICON) - NiGe metal source/drain Ge pMOSFETs for future high performance VLSI circuits applications

Zhang, Rui, Han, Jinghui, Li, Junkang, Tang, Xiaoyu, Zhao, Yi
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Year:
2017
DOI:
10.1109/ASICON.2017.8252661
File:
PDF, 358 KB
2017
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