An Optimized FinFET Channel With Improved Line-Edge...

IEEE Transactions on Nanotechnology 2017 / 11 Vol. 16; Iss. 6

An Optimized FinFET Channel With Improved Line-Edge Roughness and Linewidth Roughness Using the Hydrogen Thermal Treatment Technology

Wang, Gang, Wang, Yu, Wang, Junzhuan, Pan, Lijia, Yu, Linwei, Zheng, Youdou, Shi, Yi
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Volume:
16
Language:
english
Journal:
IEEE Transactions on Nanotechnology
DOI:
10.1109/TNANO.2017.2761803
Date:
November, 2017
File:
PDF, 992 KB
english, 2017
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