Initial reactions of ultrathin HfO 2...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2018 / 03 Vol. 36; Iss. 2

Initial reactions of ultrathin HfO 2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Kim, Seok Hwan, Song, Wooseok, Jeon, In Su, Lee, Sun Sook, Chung, Taek-Mo, An, Ki-Seok
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.5015946
Date:
March, 2018
File:
PDF, 1.76 MB
english, 2018
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