Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1987 / 1 Vol. 5; Iss. 1
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A novel high-speed nanometric electron beam lithography system: EB–F
Iwadate, KazumiVolume:
5
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.583931
Date:
January, 1987
File:
PDF, 869 KB
english, 1987