UV assisted growth of 100 Å thick SiO 2...

Electronics Letters 1991 / 05 Vol. 27; Iss. 11

UV assisted growth of 100 Å thick SiO 2 at 550°C

Kazor, A., Boyd, I.W.
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Volume:
27
Language:
english
Journal:
Electronics Letters
DOI:
10.1049/el:19910570
Date:
May, 1991
File:
PDF, 302 KB
english, 1991
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