Influence of phosphorus doping on the chemical etching rate...

Influence of phosphorus doping on the chemical etching rate of polycrystalline silicon films

Knizikevičius, R.
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Volume:
150
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2018.01.016
Date:
April, 2018
File:
PDF, 524 KB
english, 2018
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