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Spectroscopic ellipsometry studies on microstructure evolution of a-Si:H to nc-Si:H films by H 2 plasma exposure
Kanneboina, Venkanna, Madaka, Ramakrishna, Agarwal, PratimaVolume:
15
Language:
english
Journal:
Materials Today Communications
DOI:
10.1016/j.mtcomm.2018.02.023
Date:
June, 2018
File:
PDF, 2.09 MB
english, 2018