Optical emission spectroscopy as a process-monitoring tool in plasma enhanced chemical vapor deposition of amorphous carbon coatings - multivariate statistical modelling
Anooshehpour, Farid, Turgeon, Stéphane, Cloutier, Maxime, Mantovani, Diego, Laroche, GaétanVolume:
649
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.01.029
Date:
March, 2018
File:
PDF, 1.16 MB
english, 2018