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Degradation of inhibitor in alkaline cleaning solution for post-Cu CMP cleaning
Lai, Shin-Mei, Chen, Yin-Ying, Liu, Chien-Pan, Hsieh, Chien-Kuo, Lin, Jeng-YuLanguage:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2018.02.039
Date:
February, 2018
File:
PDF, 842 KB
english, 2018