![](/img/cover-not-exists.png)
Determination of etching parameters for pulsed XeF 2 etching of silicon using chamber pressure data
Sarkar, Dipta, Baboly, M G, Elahi, M M, Abbas, K, Butner, J, Piñon, D, Ward, T L, Hieber, Tyler, Schuberth, Austin, Leseman, Z CVolume:
28
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/1361-6439/aaa74e
Date:
April, 2018
File:
PDF, 2.01 MB
english, 2018