Determination of etching parameters for pulsed XeF...

Determination of etching parameters for pulsed XeF 2 etching of silicon using chamber pressure data

Sarkar, Dipta, Baboly, M G, Elahi, M M, Abbas, K, Butner, J, Piñon, D, Ward, T L, Hieber, Tyler, Schuberth, Austin, Leseman, Z C
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Volume:
28
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/1361-6439/aaa74e
Date:
April, 2018
File:
PDF, 2.01 MB
english, 2018
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