High Performance Amorphous Indium Gallium Zinc Oxide...

  • Main
  • 2018
  • High Performance Amorphous Indium Gallium Zinc Oxide...
IEEE Electron Device Letters 2018

High Performance Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors Fabricated by Atomic Layer Deposition

Cho, Min Hoe, Seol, Hyunju, Yang, Hoichang, Yun, Pil Sang, Bae, Jong Uk, Park, Kwon-Shin, Jeong, Jae Kyeong
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2018
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2018.2812870
File:
PDF, 298 KB
english, 2018
Conversion to is in progress
Conversion to is failed