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Single-fabrication-step Ge nanosphere/SiO2/SiGe heterostructures: A key enabler for realizing Ge MOS devices
Liao, Po-Hsiang, Peng, Kang-Ping, Lin, Horng-Chih, George, Tom, Li, Pei-WenLanguage:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/aab17b
Date:
February, 2018
File:
PDF, 1.28 MB
english, 2018