Activation of acceptor levels in Mn implanted Si by pulsed...

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Activation of acceptor levels in Mn implanted Si by pulsed laser annealing

Li, Lin, Bürger, Danilo, Shalimov, Artem, Kovacs, Gy. J., Schmidt, Heidemarie, Zhou, Shengqiang
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Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aab5a6
Date:
March, 2018
File:
PDF, 1.21 MB
english, 2018
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