![](/img/cover-not-exists.png)
Activation of acceptor levels in Mn implanted Si by pulsed laser annealing
Li, Lin, Bürger, Danilo, Shalimov, Artem, Kovacs, Gy. J., Schmidt, Heidemarie, Zhou, ShengqiangLanguage:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aab5a6
Date:
March, 2018
File:
PDF, 1.21 MB
english, 2018