Self-aligned photolithography for the fabrication of fully...

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Journal of Physics D Applied Physics 2018 / 03

Self-aligned photolithography for the fabrication of fully transparent high-voltage devices

Zhang, Yonghui, Mei, Zeng xia, Huo, Wenxing, Wang, Tao, Liang, Hui li, Du, Xiaolong
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Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aab638
Date:
March, 2018
File:
PDF, 1.95 MB
english, 2018
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