Rapid thermal processing of hafnium dioxide thin films by...

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Thin Solid Films 2018 / 3

Rapid thermal processing of hafnium dioxide thin films by remote plasma atomic layer deposition as high-k dielectrics

Zhang, Xiao-Ying, Hsu, Chia-Hsun, Cho, Yun-Shao, Zhang, Sam, Lien, Shui-Yang, Zhu, Wen-Zhang, Xiong, Fei-Bing
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Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.03.055
Date:
March, 2018
File:
PDF, 1.49 MB
english, 2018
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