Electrical characterization of defects introduced during...

Materials Science in Semiconductor Processing 2018 / 07 Vol. 81

Electrical characterization of defects introduced during sputter deposition of tungsten on n type 4 H -SiC

Tunhuma, Shandirai M., Auret, F.D., Legodi, M.J., Nel, J., Diale, M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
81
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2018.03.021
Date:
July, 2018
File:
PDF, 1008 KB
english, 2018
Conversion to is in progress
Conversion to is failed