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Helium Implantation Effects on Retention Behavior of Hydrogen Isotopes in Oxygen-Contained Boron Films
Yoshikawa, A., Oya, Y., Miyauchi, H., Nakahata, T., Nishikawa, Y., Suda, T., Igarashi, E., Oyaidzu, M., Tokitani, M., Iwakiri, H., Yoshida, N., Okuno, K.Volume:
52
Language:
english
Journal:
Fusion Science and Technology
DOI:
10.13182/FST07-A1602
Date:
November, 2007
File:
PDF, 469 KB
english, 2007