High Speed Bipolar ICs Using Super Self-Aligned Process...

Japanese Journal of Applied Physics 1981 / 01 Vol. 20; Iss. S1

High Speed Bipolar ICs Using Super Self-Aligned Process Technology

Sakai, Tetsushi, Kobayashi, Yoshiji, Yamauchi, Hironori, Sato, Masaaki, Makino, Takahiro
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Volume:
20
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.20S1.155
Date:
January, 1981
File:
PDF, 730 KB
1981
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