Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2018 / 03 Vol. 36; Iss. 2
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Polycarbonate as a negative-tone resist for electron-beam lithography
Zheng, Nan, Min, Haodi, Jiang, Youwei, Cheng, XingVolume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.5012028
Date:
March, 2018
File:
PDF, 2.15 MB
english, 2018