Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions
Amaral, Ana, Lavareda, G., Nunes de Carvalho, C., André, V., Vygranenko, Yuri, Fernandes, M., Brogueira, PedroVolume:
3
Year:
2018
Language:
english
Journal:
MRS Advances
DOI:
10.1557/adv.2018.113
File:
PDF, 539 KB
english, 2018