Enhanced Ti0.84Ta0.16N diffusion barriers, grown by a...

Scientific Reports 2018 / 12 Vol. 8; Iss. 1

Enhanced Ti0.84Ta0.16N diffusion barriers, grown by a hybrid sputtering technique with no substrate heating, between Si(001) wafers and Cu overlayers

Mühlbacher, Marlene, Greczynski, Grzegorz, Sartory, Bernhard, Schalk, Nina, Lu, Jun, Petrov, Ivan, Greene, J. E., Hultman, Lars, Mitterer, Christian
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
8
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/s41598-018-23782-9
Date:
December, 2018
File:
PDF, 2.85 MB
english, 2018
Conversion to is in progress
Conversion to is failed