Improved Ohmic Performance by the Metallic Bilayer Contact...

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IEEE Transactions on Electron Devices 2018

Improved Ohmic Performance by the Metallic Bilayer Contact Stack of Oxygen-Incorporated La/Ultrathin TiSiₓ on n-Si

Wang, Lin-Lin, Yu, Hao, Schaekers, Marc, Everaert, Jean-Luc, Mocuta, Dan, Horiguchi, Naoto, Collaert, Nadine, De Meyer, Kristin, Jiang, Yu-Long
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Year:
2018
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2018.2810319
File:
PDF, 2.71 MB
english, 2018
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