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[ASME 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems - Sanya, Hainan, China (January 10–13, 2007)] First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B - Dual Layer Photoresist and Back Sputtering Applied in Lift-Off Technique
Zhang, Lu, Zhang, Le, Wang, Ying, Yang, Zhenchuan, Yan, GuizhenYear:
2007
Language:
english
DOI:
10.1115/MNC2007-21560
File:
PDF, 99 KB
english, 2007