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Drain Side N+ Layout Manners ("npnpn" Arranged-Type) on ESD Robustness in the 60-V pLDMOS-SCR
Chen, Shen Li, Huang, Yu Ting, Yang, Chih Hung, Yen, Chih Ying, Chen, Kuei Jyun, Wu, Yi Cih, Lin, Jia MingVolume:
870
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.870.401
Date:
September, 2017
File:
PDF, 930 KB
english, 2017